The Effect of Height Error on Performance of Propagation Phase-Based Metalens

Abstract

Metalenses, as a new type of planar optical device with flexible design, play an important role in miniaturized and integrated optical devices. Propagation phase-based metalenses, known for their low loss and extensive design flexibility, are widely utilized in optical imaging and optical communication. However, fabrication errors introduced by thin-film deposition and etching processes inevitably result in variations in the height of the metalens structure, leading to the fabricated devices not performing as expected. Here, we introduce a reflective TiO2 metalens based on the propagation phase. Then, the relationship between the height variation and the performance of the metalens is explored by using the maximum phase error. Our results reveal that the height error of the unit structure affects the phase rather than the amplitude. The focusing efficiency of our metalens exhibits robustness to structural variations, with only a 5% decrease in focusing efficiency when the height varies within ±8% of the range. The contents discussed in this paper provide theoretical guidance for the unit design of the propagation phase-based metalens and the determination of its allowable fabrication error range, which is of great significance for low-cost and high-efficiency manufacturing.