Development of Ag-Doped ZnO Thin Films and Thermoluminescence (TLD) Characteristics for Radiation Technology

Author:

Thabit Hammam AbdurabuORCID,Kabir Norlaili A.,Ismail Abd Khamim,Alraddadi Shoroog,Bafaqeer Abdullah,Saleh Muneer Aziz

Abstract

This work examined the thermoluminescence dosimetry characteristics of Ag-doped ZnO thin films. The hydrothermal method was employed to synthesize Ag-doped ZnO thin films with variant molarity of Ag (0, 0.5, 1.0, 3.0, and 5.0 mol%). The structure, morphology, and optical characteristics were investigated using X-ray diffraction (XRD), scanning electron microscope (SEM), energy-dispersive X-ray spectroscopy (EDX), photoluminescence (PL), and UV–vis spectrophotometers. The thermoluminescence characteristics were examined by exposing the samples to X-ray radiation. It was obtained that the highest TL intensity for Ag-doped ZnO thin films appeared to correspond to 0.5 mol% of Ag, when the films were exposed to X-ray radiation. The results further showed that the glow curve has a single peak at 240–325 °C, with its maximum at 270 °C, which corresponded to the heating rate of 5 °C/s. The results of the annealing procedures showed the best TL response was found at 400 °C and 30 min. The dose–response revealed a good linear up to 4 Gy. The proposed sensitivity was 1.8 times higher than the TLD 100 chips. The thermal fading was recorded at 8% for 1 Gy and 20% for 4 Gy in the first hour. After 45 days of irradiation, the signal loss was recorded at 32% and 40% for the cases of 1 Gy and 4 Gy, respectively. The obtained optical fading results confirmed that all samples’ stored signals were affected by the exposure to sunlight, which decreased up to 70% after 6 h. This new dosimeter exhibits good properties for radiation measurement, given its overgrowth (in terms of the glow curve) within 30 s (similar to the TLD 100 case), simple annealing procedure, and high sensitivity (two times that of the TLD 100).

Funder

University of Technology Malaysia

Universiti Sains Malaysia

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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