Evaluation of Relationship between Grain Morphology and Growth Temperature of HgI2 Poly-Films for Direct Conversion X-ray Imaging Detectors

Abstract

The relationship between depositing temperature and crystallinity of grain for HgI2 polycrystalline film with 170 cm2 in area deposited by Physical Vapor Deposition (PVD) was investigated, considering the matches with readout matrix pixelation for female breast examination. The different depositing temperatures, 35, 40 and 45 °C, were carried out with the same source temperature, 100 °C, corresponding to 2–2.5 h of the growth period. The films deposited were investigated by XRD, SEM, and I–V. The results show that the grain size of the films grown increases with the depositing temperature from 35 to 45 °C. At 45 °C, the polycrystalline film has a preferred microcrystal orientation with 97.2% of [001]/[hkl] and grain size is about 180–220 μm. A 256 × 256 pixels X-ray image of a bolt, key, and wiring displacement was present distinctly with 50 keV with 6 mA current of X-ray generator. Our discussions on the relationship between depositing temperature and crystallinity of grain of film suggest that the higher growth temperature, the better crystallinity and excellent preferred microcrystal orientation of grain, however, with complementary bigger grain size. For matching readout matrix pixelation, the growth period of poly-films would be reduced appropriately for reasonable grain size and preventing the crack of films deposited.