Abstract
Carbon nanowalls are promising materials for various electrochemical devices due to their chemical inertness, desirable electrical conductivity, and excellent surface-to-mass ratio. Standard techniques, often based on plasma-assisted deposition using gaseous precursors, enable the synthesis of top-quality carbon nanowalls, but require long deposition times which represents a serious obstacle for mass applications. Here, an alternative deposition technique is presented. The carbon nanowalls were synthesized on titanium substrates using various polymers as solid precursors. A solid precursor and the substrate were mounted into a low-pressure plasma reactor. Plasma was sustained by an inductively coupled radiofrequency discharge in the H-mode at the power of 500 W. Spontaneous growth of carbon nanomaterials was observed for a variety of polymer precursors. The best quality of carbon nanowalls was obtained using aliphatic polyolefins. The highest growth rate of a thin film of carbon nanowalls of about 200 nm/s was observed. The results were explained by different degradation mechanisms of polymers upon plasma treatment and the surface kinetics.
Funder
Slovenian Research Agency
Subject
General Materials Science,General Chemical Engineering
Cited by
3 articles.
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