All-Dielectric Gratings with High-Quality Structural Colors

Author:

Wang Tongtong1,Zhao Yuanhang12,Yu Bo3,Qin Mingze4,Wei Zhihui12,Li Qiang1ORCID,Tang Haolong1,Yang Haigui1,Shen Zhenfeng1,Wang Xiaoyi1,Gao Jinsong1

Affiliation:

1. Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

2. College of Da Heng, University of the Chinese Academy of Sciences, Beijing 100039, China

3. State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

4. Jilight Semiconductor Technology Co., Ltd., Changchun 130033, China

Abstract

We present a dual-layer hafnium dioxide (HfO2) grating capable of full-color modulation in the visible spectrum by leveraging the magnetic dipole resonance induced by the lower-layer HfO2 grating, while the upper-layer HfO2 grating serves as a refractive index matching layer to effectively suppress high-order Mie resonances at shorter wavelengths. The HfO2/HfO2 grating exhibits a significantly larger distribution area in the CIE 1931 chromaticity diagram compared to the HfO2 grating. Furthermore, the structural color saturation closely approximates that of monochromatic light. Under varying background refractive index environments, this structure consistently exhibits high-quality structural color. However, the hue of the structural color undergoes alterations. When the polarization angle is below 20°, the saturation of the acquired structural color remains remarkably consistent. However, exceeding 20° results in a significant degradation in the quality of the structural color. This study demonstrates the promising potential for diverse applications, encompassing fields such as imaging and displays.

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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