Volume Hologram Formation in SU-8 Photoresist

Abstract

In order to further understand the mechanism of volume hologram formation in photosensitive polymers, light-induced material response is analyzed in commonly used epoxy-based negative photoresist Epon SU-8. For this purpose, time-resolved investigation of volume holographic grating growth is performed in the SU-8 based host–guest system and in the pure SU-8 material, respectively. The comparison of grating growth curves from doped and undoped system allows us to draw conclusions on the impact of individual components on the grating formation process. The successive formation of transient absorption as well as phase gratings in SU-8 is observed. Influence of exposure duration and UV flood cure on the grating growth are investigated. Observed volume holographic grating formation in SU-8 can be explained based on the generation and subsequent diffusion of photoacid as well as time-delayed polymerization of exposed and unexposed areas.