Correlating Disorder Microstructure and Magnetotransport of Carbon Nanowalls

Author:

Acosta Gentoiu Mijaela1,García Gutiérrez Rafael2ORCID,Alvarado Pulido José Joaquín1,Montaño Peraza Javier2,Volmer Marius3ORCID,Vizireanu Sorin4ORCID,Antohe Stefan5ORCID,Dinescu Gheorghe4ORCID,Rodriguez-Carvajal Ricardo Alberto6ORCID

Affiliation:

1. Science Institute, Meritorious Autonomous University of Puebla, Puebla 72570, Mexico

2. Departamento de Investigación en Física, Universidad de Sonora, Hermosillo 83000, Mexico

3. Department of Electrical Engineering and Applied Physics, Transilvania University of Brasov, Blvd. Eroilor 29, 500036 Brasov, Romania

4. National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Street, Magurele, 077125 Bucharest, Romania

5. Faculty of Physics, University of Bucharest, 405 Atomistilor Street, 077125 Bucharest, Romania

6. Campus Guanajuato, Universidad de Guanajuato, Noria Alta S/N, Guanajuato 36250, Mexico

Abstract

The carbon nanowalls (CNWs) grown by Plasma-Enhanced CVD reveal differences in the magnetotransport properties depending on the synthesis parameters. In this paper, we report the influence of the deposition temperature, which produces variations of the disorder microstructure of the CNWs. Relative low disorder leads to the weak localization with the transition to weak antilocalization. Higher disorder generates positive Hopping mechanism in low field with a crossover to a diffusion transport by graphene nanocrystallites. The samples reveal a similitude of the isoline density of the MR at a low temperature (<50 K), explained in the context of the magnetization. This effect is independent of the number of defects. We can achieve a desirable amount of control over the MT properties changing the CNWs’ microstructure.

Publisher

MDPI AG

Subject

Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science

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