High-Extraction-Rate Ta2O5-Core/SiO2-Clad Photonic Waveguides on Silicon Fabricated by Photolithography-Assisted Chemo-Mechanical Etching (PLACE)

Author:

Liu Jian1,Liang Youting2,Gao Lang3,Sun Chao1,Guan Jianglin1,Wang Zhe2,Liu Zhaoxiang2,Fang Zhiwei2,Wang Min2ORCID,Zhang Haisu2,Cheng Ya1234567ORCID

Affiliation:

1. State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China

2. The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China

3. State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China

4. Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, China

5. Collaborative Innovation Center of Light Manipulations and Applications, Shandong Normal University, Jinan 250358, China

6. Hefei National Laboratory, Hefei 230088, China

7. Shanghai Research Center for Quantum Sciences, Shanghai 201315, China

Abstract

We demonstrate high-extraction-rate Ta2O5-core/SiO2-clad photonic waveguides on silicon fabricated by the photolithography-assisted chemo-mechanical etching technique. Low-confinement waveguides of larger than 70% coupling efficiency with optical fibers and medium propagation loss around 1 dB/cm are investigated in the experiment. Monolithic microring resonators based on Ta2O5 waveguides have shown the quality factors to be above 105 near 1550 nm. The demonstrated Ta2O5 waveguides and their fabrication method hold great promise in various cost-effective applications, such as optical interconnecting and switching.

Funder

National Natural Science Foundation of China

National Key R&D Program of China

Fundamental Research Funds for the Central Universities

Innovation Program for Quantum Science and Technology

Shanghai Municipal Science and Technology Major Project

Science and Technology Commission of Shanghai Municipality

Engineering Research Center for Nanophotonics & Advanced Instrument, the Ministry of Education, East China Normal University

Publisher

MDPI AG

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