Improved Exponential Phase Mask for Generating Defocus Invariance of Wavefront Coding Systems

Abstract

Wavefront coding is an effective way to extend the depth of field of optical imaging systems. The invariant defocusing imaging feature can be obtained by adding a phase mask with a suitable form to the aperture of a typical optical system. Traditional exponential phase mask defocusing optical characteristics exhibit strong invariance in the frequency domain, but the point spread function (PSF) variation is significant in the image plane To reduce PSF position deviation, we presented an improved exponential phase mask. The phase function of the improved mask is obtained by analyzing the relationship between Taylor expansion and wave aberration. Numerical analysis and imaging simulation are used to evaluate the performance of the proposed phase mask to that of other standard phase masks. The simulation results show that the improved exponential phase mask has a stronger defocus invariance of the modulation transfer function (MTF), and the position deviation of the PSF has been effectively controlled.