Lead Electrodeposition from Triethylenetetramine Solution Containing Inhibitors

Author:

Ciszewski MateuszORCID,Orda SzymonORCID,Drzazga MichałORCID,Kowalik Patrycja,Hawełek ŁukaszORCID,Malec Witold,Leszczyńska-Sejda KatarzynaORCID

Abstract

Lead can be efficiently electrodeposited from a number of common leaching agents such as mineral acids, carboxylic acids, and bases (hydroxides and ammonia). This paper reports the possibility to deposit lead from a triethylenetetramine solution, which is also a powerful extracting agent for lead sulfate. The high affinity of triethylenetetramine towards lead sulfate molecules makes it a promising candidate for lead recovery from various solid materials, including industrial secondary resources, sewages, and wastes. A popular methodology that can be found in the literature to recover metal from amine is based on purging a solution with carbon dioxide, resulting in lead carbonate precipitation. Here, the direct electrodeposition of lead from an amine solution was reported. The effects of the main process parameters, i.e., current density, temperature, and presence of additives, were examined to enhance the product quality. Bone glue, ethylene glycol, and polyvinylpyrolidone were used as perspective inhibitors of dendritic lead formation. It was shown that the addition of ethylene glycol can significantly reduce their formation as well as discoloration resulting from amine, producing lead metal with a 99.9% purity.

Funder

ŁUKASIEWICZ—Institute of Non-Ferrous Metals, Gliwice, Poland

Publisher

MDPI AG

Subject

General Materials Science,Metals and Alloys

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3