Skin Capacitive Image Stitching and Occlusion Measurements

Author:

Ciortea Lorelai I.1,Chen Daqing2ORCID,Xiao Perry12ORCID

Affiliation:

1. Biox Systems Ltd., London SE1 6LN, UK

2. School of Engineering, London South Bank University, London SE1 0AA, UK

Abstract

The aim of this study is to develop new analysis techniques for skin capacitive image stitching and occlusion measurements. Through image stitching, small skin capacitive images can be stitched into large skin capacitive images and, therefore, provide more skin image information. Through occlusion, e.g., keeping the measurement device on skin for a period of time, the skin health status can be studied through time-dependent response curves. Results show that time-dependent skin capacitive imaging curves can tell us the information about transdermal water loss (TEWL) as well as skin surface profiles. By using the structural similarity index measure (SSIM), the TEWL map can be constructed, which shows the water loss map on the skin surface. We first present the theoretical background and then the experimental results.

Publisher

MDPI AG

Subject

Dermatology,Pharmaceutical Science,Aging,Chemical Engineering (miscellaneous),Surgery

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