Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism-Reference-Cited by-同舟云学术

Electrochemical Deposition of Silicon-Carbon Films: A Study on the Nucleation and Growth Mechanism

Published:2019-12-10 Issue:12 Volume:9 Page:1754
ISSN:2079-4991
Container-title:Nanomaterials
language:en
Short-container-title:Nanomaterials

Author:

Plugotarenko Nina K.,Myasoedova Tatiana N.,Grigoryev Mikhail N.,Mikhailova Tatiana S.^ORCID

Abstract

Silicon-carbon films have been deposited on silicon and Al2O3/Cr-Cu substrates, making use of the electrolysis of methanol/dimethylformamide-hexamethyldisilazane (HMDS) solutions. The electrodeposited films were characterized by Raman spectroscopy and scanning electron microscopy, respectively. Moreover, the nucleation and growth mechanism of the films were studied from the experimental current transients.

Funder

Ministry of Education of Russia

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

Link

https://www.mdpi.com/2079-4991/9/12/1754/pdf

Reference27 articles.

1. Crystallization of hydrogenated amorphous silicon carbon films with laser and thermal annealing

2. Deposition of diamond‐like carbon films by electrolysis of methanol solution

3. Low voltage and ambient temperature electrodeposition of uniform carbon films