Defect-Related Etch Pits on Crystals and Their Utilization

Author:

Lu DongzhuORCID,Jiang Quantong,Ma Xiumin,Zhang Qichao,Fu Xiaole,Fan LiangORCID

Abstract

Etch pits could form on an exposed surface of a crystal when the crystal is exposed to an etching environment or chemicals. Due to different dissolution rates along various crystalline directions in a crystal, the dissolution process is anisotropic; hence, etch pits usually have a regular shape. Here, the morphology and origin of the regular-shaped etch pits are discussed firstly; then, factors which could affect the morphology and density of etch pits are shown; finally, the state of the art of etch pit technology and the utilization of etch pits is presented. Traditionally, etch pits are utilized to evaluate the dislocation density and some defect-related properties. Now, in the modern fabrication industries, the relationship between etch pits and defects has been utilized more skillfully. High-quality crystals can be fabricated by controlling dislocations revealed by etch pits. Meanwhile, with the as-revealed dislocation as the diffusion path of atoms, new crystals will emerge in corresponding etch pits.

Funder

National Natural Science Foundation of China for Exploring Key Scientific Instruments

Wenhai Program of the S&T Fund of Shandong Province for Pilot National Laboratory for Marine Science and Technology

Guangxi Key Laboratory of Marine Environmental Science, Guangxi Academy of Sciences

Nantong Science and Technology Development Funds

Central Government Guiding Funds for Local Science and Technology Development

Publisher

MDPI AG

Subject

Inorganic Chemistry,Condensed Matter Physics,General Materials Science,General Chemical Engineering

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