Wafer-Scale Fabrication of Silicon Film on Lithium Niobate on Insulator (LNOI)

Author:

Chen Yang,Zhao Xiaomeng,Li Zhongxu,Ke Xinjian,Wang Chengli,Zhou Min,Li Wenqin,Huang Kai,Ou Xin

Abstract

Hybrid integration of silicon photonics with lithium niobate (LN) devices provides a promising route to enable an excellent modulation performance in silicon photonic integrated circuits. To realize this purpose, a substrate containing a Si film on an LNOI substrate, called Si on the LNOI structure, was analyzed and fabricated. The mode propagation properties in the Si-on-LNOI structure were simulated in detail and a vertical adiabatic coupler (VAC) between the Si waveguide and LN waveguide was simulated to help in the determination of the dimension of this structure. A 4-inch wafer-scale Si on an LNOI hybrid structure was fabricated through the ion-cut process. This structure has a single-crystalline quality, high thickness uniformity, smooth surface, and sharp bonding interface, which are practical for realizing low loss and high coupling efficiency.

Funder

National Key Research and Development of China

the National Natural Science Foundation of China

Science and Technology Commission of Shanghai Municipality

Key Research Project of Zhejiang Laboratory

Publisher

MDPI AG

Subject

Inorganic Chemistry,Condensed Matter Physics,General Materials Science,General Chemical Engineering

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