A Facile Strategy for the Preparation of N-Doped TiO2 with Oxygen Vacancy via the Annealing Treatment with Urea

Abstract

Although titanium dioxide (TiO2) has a wide range of potential applications, the photocatalytic performance of TiO2 is limited by both its limited photoresponse range and fast recombination of the photogenerated charge carriers. In this work, the preparation of nitrogen (N)-doped TiO2 accompanied by the introduction of oxygen vacancy (Vo) has been achieved via a facile annealing treatment with urea as the N source. During the annealing treatment, the presence of urea not only realizes the N-doping of TiO2 but also creates Vo in N-doped TiO2 (N-TiO2), which is also suitable for commercial TiO2 (P25). Unexpectedly, the annealing treatment-induced decrease in the specific surface area of N-TiO2 is inhibited by the N-doping and, thus, more active sites are maintained. Therefore, both the N-doping and formation of Vo as well as the increased active sites contribute to the excellent photocatalytic performance of N-TiO2 under visible light irradiation. Our work offers a facile strategy for the preparation of N-TiO2 with Vo via the annealing treatment with urea.