Nonlinear Modeling of Contact Stress Distribution in Thin Plate Substrates Subjected to Aspect Ratio

Abstract

The foundation substrate’s basal contact stresses are typically thought to have a linear distribution, although the actual form is nonlinear. Basal contact stress in thin plates is experimentally measured using a thin film pressure distribution system. This study examines the nonlinear distribution law of basal contact stresses in thin plates with various aspect ratios under concentrated loading, and it establishes a model for the distribution of contact stresses in thin plates using an exponential function that accounts for aspect ratio coefficients. The outcomes demonstrate that the thin plate’s aspect ratio significantly affects how the substrate contact stress is distributed during concentrated loading. The contact stresses in the thin plate’s base exhibit significant nonlinearity when the aspect ratio of the test thin plate is greater than 6~8. The aspect ratio coefficient-added exponential function model can better optimize the strength and stiffness calculations of the base substrate and more accurately describe the actual distribution of contact stresses in the base of the thin plate compared to linear and parabolic functions. The correctness of the exponential function model is confirmed by the film pressure distribution measurement system that directly measures the contact stress at the base of the thin plate, providing a more accurate nonlinear load input for the calculation of the internal force of the base thin plate.