Theoretical Basis for the Photoelastic Residual Stress Evaluation in Misaligned Cubic Crystals

Author:

Davì Fabrizio12ORCID,Rinaldi Daniele34ORCID,Montalto Luigi34ORCID

Affiliation:

1. DICEA & ICRYS, Universitá Politecnica delle Marche, 60131 Ancona, Italy

2. Istituto Nazionale di Fisica Nucleare, a Section of Ferrara, 44122 Ferrara, Italy

3. SIMAU & ICRYS, Universitá Politecnica delle Marche, 60131 Ancona, Italy

4. Istituto Nazionale di Fisica Nucleare, Section of Frascati, 00044 Frascati, Italy

Abstract

Photoelasticity is a fast and powerful technique for internal stress detection and quality control in crystals; to fully exploit its possibilities, an appropriate theoretical analysis must be developed for different crystallographic structure and observation planes. For a cubic crystal specimen whose geometry is non-coherent with its crystallographic directions (i.e., observation planes and crystallographic directions are not parallel), we write a set of equations that allow an estimate of the refraction indices as a function of the residual stress. This is obtained upon the assumption that the residual stress may be represented by a plane stress parallel to the observation face. For cubic crystals, we obtain an explicit estimate of the residual stress intensity; this can be achieved provided we know the piezo-optic tensor component, the orientation of two non-parallel specimen faces with respect to the crystallographic axes, and that we can measure the principal directions of the refractive indices on the observation face.

Funder

Italian Ministero dell’Istruzione, dell’Universitá e della Ricerca

Publisher

MDPI AG

Subject

Inorganic Chemistry,Condensed Matter Physics,General Materials Science,General Chemical Engineering

Reference43 articles.

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4. Review of RGB photoelasticity;Ajovalasi;Opt. Lasers Eng.,2015

5. Ramesh, K. (2000). Digital Photoelasticity: Advanced Techniques and Applications, Springer.

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