One-Way Zero Reflection in an Insulator-Metal-Insulator Structure Using the Transfer Matrix Method

Abstract

We numerically demonstrate one-way zero reflection using the transfer matrix method. Using simulations, we adjusted the thickness of SiO2 layers in a simple SiO2-Au-SiO2 layer structure. We found two solutions, 47 nm-10 nm-32 nm and 71 nm-10 nm-60 nm, which are the thicknesses for one-way zero reflection at a wavelength of 560 nm. We confirmed it with reflection spectra, where reflectance is zero for forwardly incident light and 2.5% for backwardly incident light at the wavelength 560 nm, and thickness 47 nm-10 nm-32 nm.