Abstract
The polarization beam splitter is an essential photonic integrated circuit in applications where a high-performing on-chip polarization diversity scheme is required. The lower refractive index contrast of the silicon nitride material platform compared to silicon-on-insulator constitutes the separation of polarized light states a challenging task since for this purpose a large difference between the effective refractive indices of the fundamental TE and TM modes is highly desirable. In this paper, we present the design and optimization analysis of an ultra-broadband polarization beam splitter based on a thick silicon nitride platform through extensive 3D-FDTD simulations. The proposed device exploits two different Si3N4 thicknesses that enable the discrimination of the two polarizations at the proximity of an 800 nm thick slot and a 470 nm thick strip waveguide via directional coupling. The proposed two-stage PBS achieves higher than 30.6 dB polarization extinction ratio (PER) for both TE and TM polarizations across a 130 nm span at the SCL-band. The dimensions of the PBS are 94 × 14 μm2 and the insertion losses are calculated to be lower than 0.8 dB for both polarizations. The fabrication tolerance of the device is also discussed.
Subject
Radiology, Nuclear Medicine and imaging,Instrumentation,Atomic and Molecular Physics, and Optics
Cited by
2 articles.
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