Multi-Wavelength Optical Patterning for Multiscale Materials Design

Abstract

Laser interferometry is a consolidated technique for materials structuring, enabling single step and large area patterning. Here we report the investigation of the morphological modification encoded on a thin film of a photosensitive material by the light interference pattern obtained from a laser operating in multiline mode. Four lines with equal intensity are retained, with the same p linear polarization. An azopolymer is exploited as medium for the holographic recording. Optical microscopy and profilometer measurements analyze the modification induced in the bulk and on the surface of the irradiated area. We show that the intensity profile of the interference patterns of two laser beams is the one obtained assuming each line of the laser as an independent oscillator of given intensity and wavelength, and how these light structures are faithfully replicated in the material bulk and on the topography of the free surface. Patterns at different length scales are achievable in a single step, that can be traced back to both interference fringes and wave envelopes. The proposed multi-wavelength holographic patterning provides a simple tool to generate complex light structures, able to perform multiscale modifications of photoresponsive materials