Special Issue: 15 Years of SU8 as MEMS Material
Author:
Publisher
MDPI AG
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering
Link
http://www.mdpi.com/2072-666X/6/6/790/pdf
Reference14 articles.
1. Micromachining applications of a high resolution ultrathick photoresist
2. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
3. UV-LIGA: From Development to Commercialization
4. Innovative SU-8 Lithography Techniques and Their Applications
5. SU-8 as a Material for Microfabricated Particle Physics Detectors
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanoimprint Lithography Technique for the Planarized SU-8 Nanogratings Formation on Microstructured Surfaces;2024 IEEE 25th International Conference of Young Professionals in Electron Devices and Materials (EDM);2024-06-28
2. Electrowriting of SU-8 Microfibers;Polymers;2024-06-08
3. Sensitive and Compact Evanescent-Waveguide Optical Detector for Sugar Sensing in Commercial Beverages;Sensors;2023-09-30
4. Fabrication of large-area metal and semiconductor nanobridge arrays using nanotransfer printing and UV lithography;Precision Engineering;2023-07
5. Ether cleavage and chemical removal of SU-8;SciPost Chemistry;2023-04-13
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