Interface Kinetics Assisted Barrier Removal in Large Area 2D-WS2 Growth to Facilitate Mass Scale Device Production

Abstract

Growth of monolayer WS2 of domain size beyond few microns is a challenge even today; and it is still restricted to traditional exfoliation techniques, with no control over the dimension. Here, we present the synthesis of mono- to few layer WS2 film of centimeter2 size on graphene-oxide (GO) coated Si/SiO2 substrate using the chemical vapor deposition CVD technique. Although the individual size of WS2 crystallites is found smaller, the joining of grain boundaries due to sp2-bonded carbon nanostructures (~3–6 nm) in GO to reduced graphene-oxide (RGO) transformed film, facilitates the expansion of domain size in continuous fashion resulting in full coverage of the substrate. Another factor, equally important for expanding the domain boundary, is surface roughness of RGO film. This is confirmed by conducting WS2 growth on Si wafer marked with few scratches on polished surface. Interestingly, WS2 growth was observed in and around the rough surface irrespective of whether polished or unpolished. More the roughness is, better the yield in crystalline WS2 flakes. Raman mapping ascertains the uniform mono-to-few layer growth over the entire substrate, and it is reaffirmed by photoluminescence, AFM and HRTEM. This study may open up a new approach for growth of large area WS2 film for device application. We have also demonstrated the potential of the developed film for photodetector application, where the cycling response of the detector is highly repetitive with negligible drift.