The Role of GaN in the Heterostructure WS2/GaN for SERS Applications

Author:

Ko Tsung-Shine1ORCID,Lin En-Ting1,Ho Yen-Teng2ORCID,Deng Chen-An1

Affiliation:

1. Department of Electronic Engineering, National Changhua University of Education, No. 2, Shi-Da Road, Changhua 50074, Taiwan

2. International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan

Abstract

In the application of WS2 as a surface–enhanced Raman scattering (SERS) substrate, enhancing the charge transfer (CT) opportunity between WS2 and analyte is an important issue for SERS efficiency. In this study, we deposited few-layer WS2 (2–3 layers) on GaN and sapphire substrates with different bandgap characteristics to form heterojunctions using a chemical vapor deposition. Compared with sapphire, we found that using GaN as a substrate for WS2 can effectively enhance the SERS signal, with an enhancement factor of 6.45 × 104 and a limit of detection of 5 × 10−6 M for probe molecule Rhodamine 6G according to SERS measurement. Analysis of Raman, Raman mapping, atomic force microscopy, and SERS mechanism revealed that The SERS efficiency increased despite the lower quality of the WS2 films on GaN compared to those on sapphire, as a result of the increased number of transition pathways present in the interface between WS2 and GaN. These carrier transition pathways could increase the opportunity for CT, thus enhancing the SERS signal. The WS2/GaN heterostructure proposed in this study can serve as a reference for enhancing SERS efficiency.

Funder

National Science and Technology Council of Taiwan

Publisher

MDPI AG

Subject

General Materials Science

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3