Reverse Problem in Surface Texture Analysis—One-Process Profile Modeling on the Basis of Measured Two-Process Profile after Machining or Wear

Author:

Pawlus Pawel,Reizer RafalORCID,Wieczorowski MichalORCID

Abstract

The method of the base (valley) one-process profile modeling on the basis of the measured two-process profile was developed. The base one-process random profile of the Gaussian ordinate distribution is characterized by the standard deviation of the profile height and the correlation length. The problem of estimation of the correlation length of this one-process profile exists. In the procedure of the correlation length estimation, information about the averaged shape of the autocorrelation functions of many one-process profiles after the same type of machining is required. The correlation length of the base one-process profile can be obtained on the basis of the vertical truncation of the measured two-process profile. The average error of the correlation length estimation was not higher than 7%, while the maximum error was not larger than 14%. This method can be extended to simulate the one-process texture of 3D (areal) surface topography.

Publisher

MDPI AG

Subject

General Materials Science

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