Fs Laser Patterning of Amorphous As2S3 Thin Films

Author:

Mihai Claudia1,Jipa Florin2ORCID,Socol Gabriel2ORCID,Kiss Adrian E.3ORCID,Zamfirescu Marian2,Velea Alin1ORCID

Affiliation:

1. National Institute of Materials Physics, Atomistilor 405A, 077125 Magurele, Romania

2. National Institute for Lasers, Plasma and Radiation Physics, Atomistilor 409, 077125 Magurele, Romania

3. National Institute for Optoelectronics, INOE 2000, Atomistilor 409, 077125 Magurele, Romania

Abstract

This study investigates the morphological changes induced by femtosecond (fs) laser pulses in arsenic trisulfide (As2S3) thin films and gold–arsenic trisulfide (Au\As2S3) heterostructures, grown by pulsed laser deposition (PLD). By means of a direct laser writing experimental setup, the films were systematically irradiated at various laser power and irradiation times to observe their effects on surface modifications. AFM was employed for morphological and topological characterization. Our results reveal a clear transition threshold between photoexpansion and photoevaporation phenomena under different femtosecond laser power regimes, occurring between 1 and 1.5 mW, irrespective of exposure time. Notably, the presence of a gold layer in the heterostructure minimally influenced this threshold. A maximum photoexpansion of 5.2% was obtained in As2S3 films, while the Au\As2S3 heterostructure exhibited a peak photoexpansion of 0.8%. The study also includes a comparative analysis of continuous-wave (cw) laser irradiation, confirming the efficiency of fs laser pulses in inducing photoexpansion effects.

Funder

Romanian Ministry of Research, Innovation and Digitization

Publisher

MDPI AG

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