Assessment of a Computational Protocol for Predicting Co-59 NMR Chemical Shift

Author:

Gomes Matheus G. R.1,De Souza Andréa L. F.2,Dos Santos Hélio F.3,De Almeida Wagner B.4,Paschoal Diego F. S.1ORCID

Affiliation:

1. NQTCM: Núcleo de Química Teórica e Computacional de Macaé, Polo Ajuda, Instituto Multidisciplinar de Química, Centro Multidisciplinar UFRJ-Macaé, Universidade Federal do Rio de Janeiro, Macaé 27971-525, RJ, Brazil

2. LACASO: Laboratório de Catálise Aplicada e Síntese Orgânica, Departamento de Química Orgânica, Instituto de Química, Universidade Federal do Rio de Janeiro, Cidade Universitária, Rio de Janeiro 21941-909, RJ, Brazil

3. NEQC: Núcleo de Estudos em Química Computacional, Departamento de Química—ICE, Universidade Federal de Juiz de Fora, Campus Universitário, Juiz de Fora 36036-900, MG, Brazil

4. Laboratório de Química Computacional e Modelagem Molecular (LQC-MM), Departamento de Química Inorgânica, Instituto de Química, Universidade Federal Fluminense (UFF), Outeiro de São João Batista s/n, Campus do Valonguinho, Centro, Niterói 24020-141, RJ, Brazil

Abstract

In the present study, we benchmark computational protocols for predicting Co-59 NMR chemical shift. Quantum mechanical calculations based on density functional theory were used, in conjunction with our NMR-DKH basis sets for all atoms, including Co, which were developed in the present study. The best protocol included the geometry optimization at BLYP/def2-SVP/def2-SVP/IEF-PCM(UFF) and shielding constant calculation at GIAO-LC-ωPBE/NMR-DKH/IEF-PCM(UFF). This computational scheme was applied to a set of 34 Co(III) complexes, in which, Co-59 NMR chemical shift ranges from +1162 ppm to +15,100 ppm, and these were obtained in distinct solvents (water and organic solvents). The resulting mean absolute deviation (MAD), mean relative deviation (MRD), and coefficient of determination (R2) were 158 ppm, 3.0%, and 0.9966, respectively, suggesting an excellent alternative for studying Co-59 NMR.

Funder

Brazilian agency FAPERJ

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior—Brasil

FAPEMIG

CNPq

Publisher

MDPI AG

Subject

Materials Chemistry,Chemistry (miscellaneous),Electronic, Optical and Magnetic Materials

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