Low-Temperature Annealing of Nanoscale Defects in Polycrystalline Graphite

Author:

Liu Gongyuan1,Oh Hajin1,Rahman Md Hafijur1,Du Jing1,Windes William2,Haque Aman1ORCID

Affiliation:

1. Department of Mechanical Engineering, The Pennsylvania State University, University Park, PA 16803, USA

2. Idaho National Laboratory, Idaho Falls, ID 83415, USA

Abstract

Polycrystalline graphite contains multi-scale defects, which are difficult to anneal thermally because of the extremely high temperatures involved in the manufacturing process. In this study, we demonstrate annealing of nuclear graphite NBG-18 at temperatures below 28 °C, exploiting the electron wind force, a non-thermal stimulus. High current density pulses were passed through the specimens with a very low-duty cycle so that the electron momentum could mobilize the defects without heating the specimen. The effectiveness of this technique is presented with a significant decrease in electrical resistivity, defect counts from X-ray computed tomography, Raman spectroscopy, and nanoindentation-based mechanical characterization. Such multi-modal evidence highlights the feasibility of nanoscale defect control at temperatures about two orders of magnitude below the graphitization temperature.

Funder

Nuclear Energy University Program

US Army Research Office

Publisher

MDPI AG

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