Sputtering-Deposited Ultra-Thin Ag–Cu Films on Non-Woven Fabrics for Face Masks with Antimicrobial Function and Breath NOx Response

Abstract

The multifunctional development in the field of face masks and the growing demand for scalable manufacturing have become increasingly prominent. In this study, we utilized high-vacuum magnetron sputtering technology to deposit a 5 nm ultra-thin Ag–Cu film on non-woven fabric and fabricated ultra-thin Ag–Cu film face masks. The antibacterial rates against Escherichia coli and Staphylococcus aureus were 99.996% and 99.978%, respectively, while the antiviral activity against influenza A virus H1N1 was 99.02%. Furthermore, the mask’s ability to monitor respiratory system diseases was achieved through color change (from brownish-yellow to grey-white). The low cost and scalability potential of ultra-thin silver–copper film masks offer new possibilities for practical applications of multifunctional masks.