Combined Spectroscopy System Utilizing Gas Electron Multiplier and Timepix3 Technology for Laser Plasma Experiments

Author:

De Leo Veronica12,Claps Gerardo12,Cordella Francesco12,Cristoforetti Gabriele3ORCID,Gizzi Leonida Antonio34,Koester Petra3,Pacella Danilo12,Tamburrino Antonella125

Affiliation:

1. Centro Ricerche ENEA Frascati, Via Enrico Fermi, 45, 00044 Frascati, Italy

2. Laboratori Nazionali di Frascati, Istituto Nazionale di Fisica Nucleare (INFN), Via Enrico Fermi, 54, 00044 Frascati, Italy

3. Intense Laser Irradiation Laboratory (ILIL), Istituto Nazionale di Ottica-Consiglio Nazionale delle Ricerche (INO-CNR), Sede Secondaria di Pisa, 56124 Pisa, Italy

4. Pisa Division, Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Pisa, 56127 Pisa, Italy

5. Dipartimento di Ingegneria Astronautica, Elettrica ed Energetica, Sapienza Università di Roma, Via Eudossiana, 18, 00184 Roma, Italy

Abstract

We present an innovative X-ray spectroscopy system to address the complex study of the X-ray emissions arising from laser–target interactions, where the emissions occur within extremely brief intervals from femtoseconds to nanoseconds. Our system combines a Gas Electron Multiplier (GEM) detector with a silicon-based Timepix3 (TPX3) detector. These detectors work in tandem, allowing for a spectroscopic radiation analysis along the same line of sight. With an active area of 10 × 10 cm2, the GEM detector allows for 1D measurements for X-ray energies (2–50 keV) by utilizing the full 10 cm gas depth. The high-energy part of the radiation beam exits through a downstream side window of the GEM without being absorbed in the gas volume. Positioned side-on at the GEM detector’s exit, the TPX3 detector, equipped with a pixelated sensor (55 µm × 55 µm; active area 14 mm × 14 mm), uses its full 14 mm silicon sensor to detect hard X-rays (50–500 keV) and gamma rays (0.5–10 MeV). We demonstrate the correct operation of the entire detection system and provide a detailed description of the Timepix3 detector’s calibration procedure, highlighting the suitability of the combined system to work in laser plasma facilities.

Publisher

MDPI AG

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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