Author:
Zhang Song,Wang Tingting,Zhang Ziyu,Li Jun,Tu Rong,Shen Qiang,Wang Chuanbin,Luo Guoqiang,Zhang Lianmeng
Abstract
Direct-current magnetron sputtering (DCMS) was applied to prepare vanadium (V) films on Si substrate. The influence of substrate temperature (Ts) and target–substrate distance (Dt–s) on phase structure and surface morphology of V films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscope (AFM) and transmission electron microscopy (TEM). The results show that the crystallinity of the V films increases with increasing Ts and decreasing Dt–s. The film deposited at Ts = 400 °C and Dt–s = 60 mm exhibits the best crystallinity and <111> preferred orientation with a regular tetrahedral surface morphology. Oxidation behavior of the V thin films has also been studied by X-ray photoelectron spectroscopy (XPS).
Funder
National Natural Science Foundation of China
Natural Science Foundation of Hubei Province
State Key Laboratory of Advanced Technology for Materials Synthesis and Processing
Subject
General Materials Science
Cited by
5 articles.
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