Design and Fabrication of High Performance InGaAs near Infrared Photodetector

Author:

Liu Hezhuang1,Wang Jingyi2ORCID,Guo Daqian1ORCID,Shen Kai1ORCID,Chen Baile2ORCID,Wu Jiang1

Affiliation:

1. Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China, Chengdu 610054, China

2. School of Information Science and Technology, ShanghaiTech University, Shanghai 201210, China

Abstract

InGaAs photodiodes have a wide range of important applications; for example, NIR imaging, fiber optical communication, and spectroscopy. In this paper, we studied InGaAs photodiodes with different doping concentration absorber layers. The simulated results suggested that, by reducing the absorber doping concentration from 1 × 1016 to 1 × 1015 cm−3, the maximum quantum efficiency of the devices can rise by 1.2%, to 58%. The simulation also showed that, by increasing the doping concentration of the absorber layer within a certain range, the dark current of the device can be slightly reduced. A PIN structure was grown and fabricated, and CV measurements suggested a low doping concentration of about 1.2 × 1015 cm−3. Although the thermal activation energy of the dark current suggested a distinct component of shunt dark current at a high temperature range, a dark current of ~6 × 10−4 A/cm2 (−0.5 V) was measured at room temperature. The peak quantum efficiency of the InGaAs device was characterized as 54.7% without antireflection coating and 80.2% with antireflection coating.

Funder

National Key Research and Development Program of China

Fundamental Research Funds for the Central Universities

Innovation Group Project of Sichuan Province

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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