Electrochemical Polishing of Ti6Al4V Alloy Assisted by High-Speed Flow of Micro-Abrasive Particles in NaNO3 Electrolyte

Abstract

Electrochemical polishing (ECP) is an efficient and low-cost technology for polishing difficult-to-machine materials with complex structures. However, when an environmentally friendly neutral salt solution is used as the polishing electrolyte, a dense passivation film forms on the surface of passive metals, such as titanium alloy, with a serious detrimental effect on the polishing efficiency and surface quality. In this paper, we introduce an ECP method assisted by a high-speed flow of micro-abrasive particles (ECFAP). The contribution of the flowing micro-abrasive particles in the ECP process enables the electrochemical dissolution and abrasive polishing to occur simultaneously on the workpiece surface. The high-speed abrasive particles remove the passivation film formed under ECP, thereby improving the polishing efficiency and quality. We carried out the comparative tests of conventional ECP and the proposed ECFAP on a Ti6Al4V alloy in 10% NaNO3 electrolyte; the results show that, while the matrix material forms a soft high-impedance passivation film under ECP, this film is removed by the high-speed flowing abrasive particles under ECFAP. The proposed ECFAP method improves both the polishing efficiency and the surface quality. Finally, ECFAP-treated specimens with an optimum voltage of 3 V for 10 min exhibited an average surface roughness of 0.0953 µm.