Overcoming the Trade-Off between Methanol Rejection and Proton Conductivity via Facile Synthesis of Crosslinked Sulfonated PEEK Proton Exchange Membranes

Author:

Depuydt Stef1ORCID,Traub Lucy2,Van Eygen Gilles1,Kumar Santosh3,Held Georg3,Van der Bruggen Bart1

Affiliation:

1. Department of Chemical Engineering, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium

2. Department of Chemical Engineering, The Pennsylvania State University, University Park, PA 16802, USA

3. Diamond Light Source Ltd., Harwell Science and Innovation Campus, Fermi Ave, Didcot OX11 0DE, UK

Abstract

In this work, homogeneous, thin-film proton exchange membranes (PEMs) with superior proton conductivities and high methanol rejection were fabricated via a facile synthesis procedure. Sulfonated polyether ether ketone (sPEEK) was crosslinked via a Friedel–Crafts reaction by α,α′-dichloro-p-xylene, a non-hazardous and hydrophobic compound. PEMs with varying crosslinking and sulfonation degrees were fabricated to overcome the traditional trade-off between methanol rejection and proton conductivity. The sulfonation of PEEK at 60 °C for 24 h resulted in a sulfonation degree of 56%. Those highly sulfonated backbones, in combination with a low membrane thickness (ca. 20 µm), resulted in proton conductivities superior to Nafion 117. Furthermore, X-ray photoelectron spectroscopy proved it was possible to control the crosslinking degree via the crosslinking time and temperature. The PEMs with the highest crosslinking degree showed better methanol rejection compared to the commercial benchmark. The introduction of the crosslinker created hydrophobic membrane sections, which reduced the water and methanol uptake. Subsequently, the membrane became denser due to the crosslinking, hindering the solute permeation. Those two effects led to lower methanol crossovers. This study proved the successful fabrication of PEMs overcoming the trade-off between proton conductivity and methanol rejection, following a facile procedure using low-cost and non-hazardous materials.

Funder

European Union’s Horizon 2020

EPSRC National Facility for XPS

Publisher

MDPI AG

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