Modeling and Simulation-Based Layout Optimization for Tolerance to TID Effect on n-MOSFET

Abstract

In the present study, the layout structure of an n-MOSFET, which is vulnerable to radiation, was designed in a different way to enhance its tolerance to radiation. Radiation damage assessment was conducted using modeling and simulation (M&S) techniques before actual semiconductor process fabrication and radiation tests to verify its tolerance properties. Based on the M&S techniques, the role of each layer was determined to improve the radiation tolerance of semiconductors, and the layout design of an n-MOSFET with enhanced radiation tolerance was optimized. The optimized radiation-tolerant n-MOSFET design was implemented in the 0.18-um CMOS bulk process, and radiation exposure tests were conducted on the device. A cumulative radiation dose up to 2 Mrad(Si) was applied to verify its radiation-tolerant performance. Developing new devices using M&S techniques for radiation damage assessment allows reliable estimates of their electrical and radiation-tolerant properties to be obtained in advance of the actual manufacturing process, thereby minimizing development costs and time.