Author:
Krishna T. N. V.,Sathishkumar P.,Himasree P.,Punnoose Dinah,Raghavendra K. V. G.,Himanshu ,Naresh Bandari,Rana R. A.,Kim Hee-Je
Abstract
High-power plasma power supply is very useful for many industrial and medical applications. Plasma is generated artificially in the laboratory or industry by applying the electric or magnetic field. In this manuscript, we presented the simple 4T analog MOS control high voltage high frequency inverter circuit as a plasma power supply using modulation index technique. The presented plasma power supply operated at 25 kHz frequency and 10 kV peak to peak voltage. It generates a 0 V to 10 kV controllable electric field. The generated electric field is applied and produces plasma, which can be used for many industrial applications. A 10 kV to 5 kW plasma power supply has been practically developed based on the proposed topology and experimentally tested and, additionally, excellent output power conversion efficiency is achieved. From these results, the 4T analog MOS control high voltage high frequency (HVHF) plasma switching power supply is verified.
Subject
Electrical and Electronic Engineering,Computer Networks and Communications,Hardware and Architecture,Signal Processing,Control and Systems Engineering
Cited by
11 articles.
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