Productivity of Concentration-Dependent Conversion of Substitutional Nitrogen Atoms into Nitrogen-Vacancy Quantum Emitters in Synthetic-Diamond by Ultrashort Laser Pulses

Author:

Kudryashov Sergey1ORCID,Danilov Pavel1ORCID,Kuzmin Evgeny1ORCID,Smirnov Nikita1,Gorevoy Alexey1ORCID,Vins Victor12,Pomazkin Daniil1,Paholchuk Petr1ORCID,Muratov Andrey1,Kirichenko Alexey3ORCID,Rodionov Nikolay3,Vasil’ev Evgeny4

Affiliation:

1. Lebedev Physical Institute, 119991 Moscow, Russia

2. LLC VELMAN, 630058 Novosibirsk, Russia

3. Institution “Project Center ITER”, 123182 Moscow, Russia

4. Saint-Petersburg Mining University, 199106 Saint-Petersburg, Russia

Abstract

Tightly focused 515-nm, 0.3-ps laser pulses modify in a laser filamentation regime the crystalline structure of an Ib-type high-pressure, high-temperature (HPHT) synthesized diamond in a thin-plate form. The modified microregions (micromarks) in the yellow and colorless crystal zones, possessing different concentrations of elementary substitutional nitrogen (N) impurity atoms (C-centers), exhibit their strongly diminished local IR absorption (upon correction to the thickness scaling factor). Simultaneously, local visible-range (400–550 nm) absorption coefficients were increased, and photoluminescence (PL) yield was strongly enhanced in the broad range of 450–800 nm. The strong yellow-red PL enhancement saturates with laser exposure, implying the complete conversion of C-centers into nitrogen-vacancy (NV0,−) ones due to the laser-induced generation of Frenkel “interstitial-vacancy” I–V carbon pairs. The other emerging blue-green (>470 nm) and green-yellow (>500 nm) PL bands were also simultaneously saturated versus the laser exposure. The observed IR/optical absorption and PL spectral changes enlighten the ultrashort pulse laser inscription of NV0−-based quantum-emitter centers in synthetic diamonds and enable the evaluation of the productivity of their inscription along with the corresponding I–V generation rates.

Funder

Russian Science Foundation

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering

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