Radical copolymerization of 2-trifluoromethylacrylic monomers. I. Kinetics of their copolymerization with norbornenes and vinyl ethers as studied byin situ1H NMR analysis-Reference-Cited by-同舟云学术

Radical copolymerization of 2-trifluoromethylacrylic monomers. I. Kinetics of their copolymerization with norbornenes and vinyl ethers as studied byin situ1H NMR analysis

Published:2004 Issue:6 Volume:42 Page:1468-1477
ISSN:0887-624X
Container-title:Journal of Polymer Science Part A: Polymer Chemistry
language:en
Short-container-title:J. Polym. Sci. A Polym. Chem.

Author:

Ito Hiroshi,Miller Dolores C.

Publisher

Wiley

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference24 articles.

1. Chemical amplification resists: Inception, implementation in device manufacture, and new developments

2. Outlook for 157-nm resist design

3. Polymer design for 157-nm chemically amplified resists

4. Novel Fluoropolymers for Use in 157nm Lithography.

5. Development of 157 nm positive resists

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