Thin-Film Deposition Processes-Reference-Cited by-同舟云学术

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Thin-Film Deposition Processes

Published:2016-09-23 Issue: Volume: Page:157-189
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Container-title:Handbook of Software Solutions for ICME
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Author:

Pflug Andreas¹,Siemers Michael¹,Melzig Thomas¹,Keunecke Martin²,Schäfer Lothar³,Bräuer Günter⁴

Affiliation:

1. Low Pressure Plasma Processes; Fraunhofer Institute for Surface Engineering and Thin Films IST; Bienroder Weg 54e 38108 Braunschweig Germany

2. Center for Tribological Coatings; Fraunhofer Institute for Surface Engineering and Thin Films IST; Bienroder Weg 54e 38108 Braunschweig Germany

3. Chemical Vapour Deposition; Fraunhofer Institute for Surface Engineering and Thin Films IST; Bienroder Weg 54e 38108 Braunschweig Germany

4. Fraunhofer Institute for Surface Engineering and Thin Films IST; Bienroder Weg 54e 38108 Braunschweig Germany

Publisher

Wiley-VCH Verlag GmbH & Co. KGaA

Reference70 articles.

1. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings;Thornton;J. Vac. Sci. Technol.,1974

2. Nucleation and growth in TiO2 films prepared by sputtering and evaporation;Löbl;Thin Solid Films,1994

3. The base layer effect on the d.c. conductivity and structure of direct current magnetron sputtered thin films of silver;Arbab;Thin Solid Films,2001

4. The microstructural properties of sputtered zinc oxide SAW transducers;Hickernell;Rev. Phys. Appl.,1985

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of High Quality Bornite and Chalcopyrite Thin Films by Aerosol-Assisted Chemical Vapor Deposition;The Journal of Physical Chemistry C;2023-07-10

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