Epitaxy of Ge Layers on Blanket and Patterned Si(001) for Nanoelectronics and Optoelectronics
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Publisher
Wiley-VCH Verlag GmbH & Co. KGaA
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/9783527650200.ch3/fullpdf
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1. An FDTD Investigation of Compact and Low-Voltage Waveguide-Integrated Plasmonic Ge/SiGe Multiple Quantum Wells Photodetectors;IEEE Photonics Journal;2022-10
2. Lasing in Group-IV Materials;Topics in Applied Physics;2021
3. Assessment of the growth/etch back technique for the production of Ge strain-relaxed buffers on Si;Journal of Crystal Growth;2018-04
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