Kinetic parameters for step and flash imprint lithography photopolymerization-Reference-Cited by-同舟云学术

Kinetic parameters for step and flash imprint lithography photopolymerization

Published:2006 Issue:2 Volume:52 Page:777-784
ISSN:0001-1541
Container-title:AIChE Journal
language:en
Short-container-title:AIChE J.

Author:

Dickey Michael D.,Willson C. Grant

Publisher

Wiley

Subject

General Chemical Engineering,Environmental Engineering,Biotechnology

Reference49 articles.

1. , , , , , , , , , , , . Advances in Step and Flash Imprint Lithography. Proceedings of SPIE-The International Society for Optical Engineering. 5037(Pt. 1, Emerging Lithographic Technologies VII): 2003; 197-202.

2. Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology.

3. Step and flash imprint lithography: Defect analysis

4. International Technology Roadmap for Semiconductors. Semiconductor Industry Association: San Jose, CA; 2003.

5. Kinetic approach of oxygen inhibition in ultraviolet- and laser-induced polymerizations

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