48.1: Inline Low Temperature Polycrystalline Silicon Roughness and Grain Size Metrology Enabled by Electron Beam Review for a Better Process Control of Excimer Laser Annealing-Reference-Cited by-同舟云学术

48.1: Inline Low Temperature Polycrystalline Silicon Roughness and Grain Size Metrology Enabled by Electron Beam Review for a Better Process Control of Excimer Laser Annealing

Published:2022-10 Issue:S1 Volume:53 Page:478-481
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:Symp Digest of Tech Papers

Author:

Meng Lin¹,Li Lingjia¹,Knaub Nikolai¹,Li Xiao¹,Li Ji¹,Trauner Robert¹,Schueler Bernhard¹,Huang Shiwen¹,Mueller Bernhard¹,Daiker Volker¹

Affiliation:

1. Applied Materials, Santa Clara, USA; Shanghai, P.R. China Munich Germany

Publisher

Wiley

Subject

General Medicine

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.15994

Reference11 articles.

1. Polycrystalline silicon thin film transistors;Brotherton S. D.;Semiconductor science and technology,1995

2. Effect of SiO2 Buffer Layer Thickness on Performance and Reliability of Flexible Polycrystalline Silicon TFTs Fabricated on Polyimide;Chen B.-W.;IEEE Electron Device Lett.,2016

3. Hysteresis characteristics in low temperature poly-Si thin film transistors;Chung Hoon-Ju;Journal of Information Display,2005

4. New PMOS LTPS–TFT pixel for AMOLED to suppress the hysteresis effect on OLED current by employing a reset voltage driving;Lee J. H.;Solid-State Electron,2008

5. Hysteresis analysis in excimer-laser-annealed low-temperature polycrystalline-silicon thin-film transistors;Kim Yu-Mi;Journal of the SID 20/7,2012

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1. P‐148: Inspection of Excimer‐Laser Annealed Thin Silicon Films Across the Length Scale of Interest;SID Symposium Digest of Technical Papers;2023-06