ITO-coatings by reactive low-voltage ion plating: film properties and plasma analysis

Author:

Huber Daniel,Pulker H.K

Publisher

Wiley

Subject

Surfaces, Coatings and Films,Condensed Matter Physics

Reference23 articles.

1. M. Fahland (Fraunhofer FEP): „TCO Web-Coating - Basistechnologie für die Polymere Elektronik”︁, OTTI-Fachtagung: „Transparent leitfähige Schichten (TCO)”︁ (Würzburg, 2007)

2. Overview about the optical properties and mechanical stress of different dielectric thin films produced by reactive-low-voltage-ion-plating

3. E. Moll, H.K. Pulker, W. Haag, „Method and apparatus for the reactive vapour deposition of layers of oxides, nitrides, oxynitrides and carbides on a substrate”︁, United States Patent, Patent Number: 4.619.748 (1986)

4. Optical and Structural Characteristics of Ion-Plated Nb2O5 and HfO2 Films

5. J.R. Ehrstein, M. Carroll Croarkin, Hung Kung Liu: „The Certification of 100 mm Diameter Silicon Resistivity SRMs 2541 Through 2547 Using Dual-Configuration Four-Point Probe Measurements, 2006 Edition”︁, NIST Special Publication 260-131 (2006)

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