Spatial distribution of channeled ions-Reference-Cited by-同舟云学术

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Spatial distribution of channeled ions

Published:1981-05-16 Issue:1 Volume:65 Page:107-117
ISSN:0031-8965
Container-title:Physica Status Solidi (a)
language:de
Short-container-title:Phys. Stat. Sol. (a)

Author:

Kumakhov M. A.,Muralev V. A.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference41 articles.

1. Ion implantation in semiconductors—Part I: Range distribution theory and experiments

2. , and , Ion Alloyage of Semiconductors, Mir, Moscow 1973.

3. A collection of papers on ion implantation. Atomizdat, Moscow 1971.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Angular distributions of channeled particles;Radiation Effects and Defects in Solids;1994-10

2. Trapping of negatively-charged particles GeV-energies into a channel;Radiation Effects;1984-01

3. Channeling of Ultrarelativistic Electrons in Crystals;physica status solidi (b);1983-07-01

4. BIBLIOGRAPHY;Materials Analysis by Ion Channeling;1982

5. Spatial distributions of channeled ions. Comparison with experiments;Physica Status Solidi (a);1981-06-16

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