Structure of SiO2 pyrolitic films on Ge substrates-Reference-Cited by-同舟云学术

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Structure of SiO2 pyrolitic films on Ge substrates

Published:1977-10-16 Issue:2 Volume:43 Page:659-666
ISSN:0031-8965
Container-title:Physica Status Solidi (a)
language:en
Short-container-title:Phys. Stat. Sol. (a)

Author:

Pchelyakov O. P.,Gorokhov E. B.,Pokrovskaya S. V.,Sokolov L. V.,Stenin S. I.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Svoistva structur metal–dielektrik poluprovodnik, Izd. Nauka, Moscow 1976.

2. Structural Evaluation of Silicon Oxide Films

3. Photolitographiya v proizvodstve poluprovodnikovykh priborov, Izd. Energiya, Moscow 1968.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanical and electrical properties of the double-layer film system GeO2–Si3N4 on Ge;Physica Status Solidi (a);1987-06-16

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