Interdiffusion of FeTi Multilayers Studied by In-Situ X-Ray Diffraction-Reference-Cited by-同舟云学术

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Interdiffusion of FeTi Multilayers Studied by In-Situ X-Ray Diffraction

Published:1993-05-16 Issue:1 Volume:137 Page:125-133
ISSN:0031-8965
Container-title:Physica Status Solidi (a)
language:de
Short-container-title:Phys. Stat. Sol. (a)

Author:

Bai H. Y.,Chen H.,Zhang Y.,Wang W. K.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Formation of an Amorphous Alloy by Solid-State Reaction of the Pure Polycrystalline Metals

2. Diffusion and precipitation in amorphous Si

3. Diffusivity of gold in amorphous silicon measured by the artificial multilayer technique

4. Dependence of the interdiffusion coefficient on the modulation wavelength in Fe-Ti multilayer films

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. TiFe;Magnetic Properties of Metals: Magnetic and Electric Properties of Magnetic Metallic Multilayers;2022

2. Interdiffusion in metal/amorphous Si multilayers;Materials Science and Engineering: A;1994-05

3. Amorphization phenomenon in Ni/amorphous Si multilayers;Journal of Materials Research;1994-02

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