Investigation of Interfacial Reactions in Bimetallic Thin-Film Couples of Al/Cu and Pb/Cu by Measurement of Contact Resistance

Author:

Shearer M. P.,Sen S. K.,Bauer C. L.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. , and , Thin Films–Interdiffusion and Reactions, John Wiley & Sons, New York 1978.

2. Special aspects of diffusion in thin films

3. and , Final Rep. RADC-TR-66-165, Philco-Ford Corp., Microelectronics Div., Blue Bell (Pa) April 1966.

4. Resistometric investigation of initial interdiffusion in AgAu thin film couples

5. and , Proc. XIII. Ann. Meeting Society for Engineering Sci., Hampton, VA NASA Conf. Publ. 1, 3 (1976).

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