Alloying of thin palladium films with single crystal and amorphous silicon

Author:

Lee D. H.,Hart R. R.,Kiewit D. A.,Marsh O. J.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. , and , Proc. Internat. Conf. Ion Implantation, Garmisch-Partenkirchen (Germany), Springer-Verlag, Berlin, 1971.

2. Effects of Al Films on Ion‐Implanted Si

3. Enhanced Migration of Implanted Sb and In in Si Covered with Evaporated Al

4. , and , Ion Implantation in Semiconductors, Academic Press, New York, 1970.

5. Metallurgical properties and electrical characteristics of palladium silicide-silicon contacts

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