Interface Controlled Electrical Percolation of CrNi/SiOx Metal/Insulator Thin Films atT

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Interface Controlled Electrical Percolation of CrNi/SiOx Metal/Insulator Thin Films atT > 850 K

Published:1991-11-16 Issue:1 Volume:128 Page:139-144
ISSN:0031-8965
Container-title:Physica Status Solidi (a)
language:de
Short-container-title:Phys. Stat. Sol. (a)

Author:

Riesenberg R.,Thrum F.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Aging model of reactively deposited thin NiCr films

2. , and , Beitr. 10. Tagung Hochvakuum, Grenzflächen/Dünne Schichten, Dresden March 1990, ed. by Physikalische Gesellschaft (p. 281).

3. Proc. SENSOR 91, Congr. Sensorik & Systemtechnik; Nürnberg May 1991, Vol. II, Publisher ACS Organisations GmbH, W-3050 Wunstorf-Slemhude (p. 111).

4. and , presented on II. Internal. Sem. Electronic Properties of Metal/Nonmetal Microsystems, Stirzin (CSSR) 1989.

5. Zirconium Nitride Thin-Film Resistors With High Thermal Durability

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