Probing the Roughness of Porphyrin Thin Films with X‐ray Photoelectron Spectroscopy-Reference-Cited by-同舟云学术

Probing the Roughness of Porphyrin Thin Films with X‐ray Photoelectron Spectroscopy

Author:

Kataev Elmar¹^ORCID,Wechsler Daniel¹,Williams Federico J.²,Köbl Julia¹,Tsud Natalia³,Franchi Stefano⁴,Steinrück Hans‐Peter¹,Lytken Ole¹

Affiliation:

1. Department of Chemistry and Pharmacy Friedrich-Alexander Universität Erlangen-Nürnberg Egerlandstraße 3 Erlangen 91058 Germany

2. Departamento de Química Inorgánica, Analítica y Química Física Universidad de Buenos Aires Pabellón 2 Buenos Aires C1428EHA Argentina

3. Department of Surface and Plasma Science Charles University V Holešovičkách 2 Prague 11636 Czech Republic

4. Istituto di Struttura della Materia Consiglio Nazionale delle Ricerche via Fosso del Cavaliere 100 Roma Italy

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics

Link

Reference89 articles.

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