Amine-stabilized cyclopentadienyl diisobutyl aluminum complexes as new kinds of precursors for the deposition of thin aluminum films by CVD
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference23 articles.
1. in Thin Film Processes II (Eds: ), Academic Press, San Diego, CA 1991, p. 79.
2. in Thin Film Processes II (Eds: ), Academic Press, San Diego, CA 1991, p. 177.
3. Step coverage prediction in low-pressure chemical vapor deposition
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